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It is a compact tabletop CVD surface treatment device equipped with a hot filament (hot wire).
The W filament installed near the sample can be heated up to 2000°C, promoting the decomposition of various reaction gases. The active species (radicals) generated by gas decomposition accumulate on the sample surface to form a film.
Equipped with a rapid cooling mechanism using slide movement of the furnace.
This is a tubular furnace thermal CVD device for synthesizing graphene films. It is equipped with a slide movement mechanism for the furnace, allowing for rapid heating and cooling of samples. An optional motor-driven automatic slide function can also be added. Additionally, by adding a turbo vacuum pump as an option, even higher quality graphene can be deposited.
